发明名称 Nonvolatile memory devices that use resistance materials and internal electrodes
摘要 A nonvolatile memory device, a method of fabricating the nonvolatile memory device and a processing system including the nonvolatile memory device. The nonvolatile memory device may include a plurality of internal electrodes that extend in a direction substantially perpendicular to a face of a substrate, a plurality of first external electrodes that extend substantially in parallel with the face of the substrate, and a plurality of second external electrodes that also extend substantially in parallel with the face of the substrate. Each first external electrode is on a first side of a respective one of the internal electrodes, and each second external electrode is on a second side of a respective one of the internal electrodes. These devices also include a plurality of variable resistors that contact the internal electrodes, the first external electrodes and the second external electrodes.
申请公布号 US8698281(B2) 申请公布日期 2014.04.15
申请号 US201213655584 申请日期 2012.10.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAEK IN-GYU;SIM HYUN-JUN;ZHAO JIN-SHI;YIM EUN-KYUNG
分类号 H01L29/00 主分类号 H01L29/00
代理机构 代理人
主权项
地址