| 发明名称 |
Photolithographic methods |
| 摘要 |
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices. |
| 申请公布号 |
US8697338(B2) |
申请公布日期 |
2014.04.15 |
| 申请号 |
US201213607729 |
申请日期 |
2012.09.09 |
| 申请人 |
BAE YOUNG CHEOL;BELL ROSEMARY;PARK JONG KEUN;LEE SEUNG-HYUN;ROHM AND HAAS ELECTRONICS MATERIALS LLC |
发明人 |
BAE YOUNG CHEOL;BELL ROSEMARY;PARK JONG KEUN;LEE SEUNG-HYUN |
| 分类号 |
G03F7/26 |
主分类号 |
G03F7/26 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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