A PHOTORESIST STRIPPER COMPOSITION RESTRAINING GALVANIC CORROSION

摘要

The present invention relates to a photoresist stripper composition. The composition improves the removal of residue of photoresist by dry/wet etching in the formation of patterns during the process of a TFT(Thin film transistor) among the manufacturing processes of a flat panel display substrate and suppresses a galvanic phenomenon by preventing corrosion in aluminum, copper, tungsten, molybdenum, titanium, niobium, capable of generating a galvanic phenomenon during the removal of photoresist and a metal wire in which alloy wires including the same are dually or triply laminated.