| 摘要 |
The objective of the present invention is to conveniently and efficiently suppress the generation of frames at the peripheral part of the coating film (RM) formed at a substrate (G) in a drying process and to improve uniformity in the thickness of the film after drying. In a process for suppressing the generation of a frame, when solvent is drying at each part of the coating film (RM), which is in a liquid state, of the substrate (G) in an infrared radiation chamber in a drying process, the liquid flows from the central part to the peripheral part at the coating film (RM) due to the high drying speed of the solvent at the peripheral part where the surface in contact with the outer part is larger than the central part of the coating film, and also certain temperature difference between the central part and the peripheral part of the coating film (RM) is generated due to the local infrared radiation for the peripheral part of the coating film (RM). Therefore, the generation of a frame is prevented or suppressed, since surface tension between the central part and the peripheral part of the coating film (RM) is balanced. |
