发明名称 |
TAMPON DE POLISSAGE BIAISE RADIALEMENT ET PROCEDE DE POLISSAGE L'UTILISANT |
摘要 |
<p>A polishing layer (140) has an annular polishing track (125) concentric with rotational center (102). The radial micro-channels are formed in the polishing layer within width (133) of the annular polishing track and a majority of the micro channels have a radial orientation and an average width less than 50mu m. An independent claim is included for substrate polishing method.</p> |
申请公布号 |
FR2884164(B1) |
申请公布日期 |
2014.04.11 |
申请号 |
FR20060051303 |
申请日期 |
2006.04.11 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
发明人 |
MULDOWNEY GREGORY P |
分类号 |
B24B37/04;B24D99/00;B24B7/00;B24B37/26 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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