气体清净装置及半导体制造装置,申请号TW096112081-传众专利搜索

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发明名称	气体清净装置及半导体制造装置
摘要
申请公布号	TWI434324	申请公布日期	2014.04.11
申请号	TW096112081	申请日期	2007.04.04
申请人	东京威力科创股份有限公司日本	发明人	土桥和也;林辉幸;田村明威
分类号	H01L21/02	主分类号	H01L21/02
代理机构		代理人	林志刚台北市中山区南京东路2段125号7楼
主权项
地址	日本

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