| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas injection device and an injector pipe used in the device, more specifically, a gas injection device injecting a gas onto a substrate in chemical vapor deposition (CVD), and an injector pipe used in the device.SOLUTION: The gas injection device includes: a body; a gas passage formed along the lengthwise direction from one side end to the other side end of the body in the body; a blade which is formed in the body and connected to the gas passage and injects a gas; and an injector pipe which is inserted into the gas passage and supplied with the gas by a gas supply part and distributes the gas to the gas passage through a plurality of holes. The plurality of holes formed in the injector pipe consist of a plurality of first holes and a plurality of second holes formed on two mutually parallel lines along the lengthwise direction of the injector pipe, and the first and second holes are formed alternately. |
