| 发明名称 |
Stripping and Cleaning Compositions for Removal of Thick Film Resist |
| 摘要 |
Stripping and cleaning compositions suitable for the removal of film resists include about 2-55% by weight of at least one alkanolamine or at least one morpholine or mixtures thereof; about 20-94% by weight of at least one organic solvent; and about 0.5-60% by weight water based on the total weight of the composition. |
| 申请公布号 |
US2014100151(A1) |
申请公布日期 |
2014.04.10 |
| 申请号 |
US201314043330 |
申请日期 |
2013.10.01 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS INC. |
发明人 |
EGBE MATTHEW I.;WU AIPING;RAO MADHUKAR BHASKARA |
| 分类号 |
G03F7/42 |
主分类号 |
G03F7/42 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
