| 摘要 |
PROBLEM TO BE SOLVED: To provide a high performance functional film having high gas barrier property or the like.SOLUTION: The functional film has an inorganic layer containing silicon nitride as a main component on the surface of a substrate whose surface is composed of an organic compound. The functional film is characterized in that the inorganic layer has a residual compression stress of 200-4,000 MPa, and in a fourier transformation infrared absorption spectrum, the peak of Si-N bond located in 800-900 cm, the peak of Si-H bond located in 2,100-2,200 cm, and the peak of N-H located in 3,300-3,400 cmsatisfy [0.02<SiH/SiN<0.14] and [0.005<NH/SiN<0.09]. |
