| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern formation method capable of improving flatness of chemical-epitaxy and easily transferring a microphase separation pattern to a lower layer film.SOLUTION: According to an embodiment, a pattern formation method comprises the steps of: forming a resist pattern including an opening through which a first region of a coating-type glass film is exposed, the coating-type glass film provided on a substrate via a processed film; forming a neutralization film on the coating-type glass film; forming a self-organization material layer having a first and a second segment on the coating-type glass film; forming a self-organization pattern having a first portion including the first segment and a second portion including the second segment by microphase-separating the self-organization material layer; and removing one of the first portion and the second portion and processing the processed film using the other as a mask. |
