发明名称 SELF-ASSEMBLED PATTERN FORMING METHOD
摘要 A self-assembled pattern forming method in an embodiment includes: forming a guide pattern on a substrate; forming a layer of a first polymer; filling a first block copolymer; and phase-separating the first block copolymer. The guide pattern includes a first recessed part having a depth T and a diameter D smaller than the depth T, and a second recessed part having a width larger than double of the diameter D. The first block copolymer has the first polymer and a second polymer which are substantially the same in volume fraction. By phase-separating the first block copolymer, a cylinder structure and a lamellar structure are obtained.
申请公布号 US2014097152(A1) 申请公布日期 2014.04.10
申请号 US201313930262 申请日期 2013.06.28
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HIEDA HIROYUKI;KAMATA YOSHIYUKI;KIHARA NAOKO;KIKITSU AKIRA;YAMAMOTO RYOSUKE
分类号 G03F7/34 主分类号 G03F7/34
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