| 摘要 |
PROBLEM TO BE SOLVED: To treat a substance uniformly while reducing the amount of a chemical used.SOLUTION: While a substrate 1 is moved, a chemical 2 is supplied to a chemical nozzle 21 from a chemical tank 23; the chemical 2 is discharged onto the substrate 1 from the chemical nozzle 21; and the chemical 2 discharged onto the substrate 1 from the chemical nozzle 21 is recovered and returned to the chemical tank 23. The concentration, standing for the degree of deterioration of the chemical 2, of the chemical 2 to be supplied to the chemical nozzle 21 from the chemical tank 23 is detected, and the substrate 1 is treated while the treatment time for the substrate 1 is controlled by oscillating forward and backward the direction of the movement of the substrate 1, on the basis of the detection results of the concentration of the chemical 2. Cleaning solution is discharged onto the substrate 1 from a cleaning solution nozzle 31 arranged at a location separated from the chemical nozzle 21 in the direction of the movement of the substrate 1 so as to wash away the chemical 2 from the substrate 1. |
