发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD, AND DEVICE-MANUFACTURING METHOD
摘要 The present invention provides three 2D heads (60i, 60ia, 60ib (i=1-4)) at the corner section of each of the first, second, third and fourth quadrants which originate at the center on the surface of a stage (WST1). While powering the stage (WST1), the position of the stage (WST1) is measured by using, of the four heads (60i (i=1, 2, 3, 4), the three heads (60i) facing a 2D grating (RG) of a scale plate (21) positioned above the stage (WST1). While powering, differential data for the measured values is captured pertaining to the measurement direction of the remaining two heads (60ia, 60ib) besides the heads (60i) among each set of three heads belonging to the head groups (61i) to which the three heads respectively belong. Using this differential data, the grid error in the measurement direction of the 2D grating (RG) is calibrated.
申请公布号 WO2014054690(A1) 申请公布日期 2014.04.10
申请号 WO2013JP76820 申请日期 2013.10.02
申请人 NIKON CORPORATION 发明人 SHIBAZAKI, YUICHI
分类号 H01L21/027;G01B11/00;G01B11/26;G03F7/20;H01L21/68 主分类号 H01L21/027
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