| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering system having a function capable of reducing maintenance time accompanying collimator exchange and improving production efficiency.SOLUTION: The sputtering system includes a place for placing a collimator in each of a sputtering chamber and a conveying chamber and the collimator can be moved between the chambers. A conveyer used for sample conveyance is utilized to move the collimator. The sputtering system capable of commonly using a collimation method and a usual sputtering method in deposition even in a single chamber can reduce maintenance, improve productivity and place a shutter plate. |
