| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for stabilizing a fluorine-containing acid amplifier useful for forming a fine photoresist pattern, by preparing the amplifier in a solution state.SOLUTION: The method for stabilizing a fluorine-containing acid amplifier comprises dissolving a fluorine-containing acid amplifier expressed by formula (I) in an organic solvent to prepare a fluorine-containing acid amplifier solution. In the formula, W represents a straight-chain or branched-chain saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms or a cyclic saturated or unsaturated hydrocarbon group having 3 to 20 carbon atoms, which may have a substituent; X represents a single bond, -(CRR)(O)(C=O)-, or -R(O)(C=O)-; and Y is selected from formulae (a):-C(=CH)Z,(b):-CHF, and (c):a cyclic saturated or unsaturated hydrocarbon group having 3 to 12 carbon atoms, which may have a substituent. |
