Illumination optics for extreme UV projection lithography, is designed such that any pairs of illumination light sub-bundles which are guided by different channels hit illumination field point during operation of optics

摘要

The optics (26) has faceted mirror (19) having several facets (25) used to guide illumination light (16) to illumination field (5). Each facet specifies a respective illumination channel (27-1-27-6), which guides an illumination light sub-bundle. The optics is designed such that any pairs of illumination light sub-bundles which are guided by different channels hit the illumination field point at incidence times at every point of illumination field, during operation of optics, and the time difference is greater than coherence duration of illumination light. An independent claim is included for a projection exposure method.