发明名称 Precursors for gst films in ald/cvd processes
摘要 A process of making an antimony-containing or bismuth containing film such as a germanium-antimony-tellurium alloy (GST) or germanium-bismuth-tellurium (GBT) film uses a process selected from atomic layer deposition and chemical vapor deposition. A silylantimony precursor or silylbismuth precursor is used as a source of antimony or bismuth.
申请公布号 EP2698373(A3) 申请公布日期 2014.04.09
申请号 EP20130180256 申请日期 2013.08.13
申请人 AIR PRODUCTS AND CHEMICALS, INC. 发明人 XIAO, MANCHAO;BUCHANAN, IAIN;LEI, XINJIAN
分类号 C07F9/90;C07C395/00;C07F9/94;C23C16/18 主分类号 C07F9/90
代理机构 代理人
主权项
地址