| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound for photoresist used for performing a fine processing by utilizing photolithography, a photoresist solution by using the compound for photoresist, and a method for etching a desired surface by using the photoresist solution. <P>SOLUTION: This compound for photoresist is selected from the group consisting of a cyanine pigment and a styryl pigment. The photoresist solution is provided by containing the compound for photoresist. The method for etching a surface to be processed is provided by using the photoresist solution. <P>COPYRIGHT: (C)2009,JPO&INPIT |
