| 摘要 |
According to one embodiment, there is provided a method of forming a pattern, comprising (i) forming a film from an actinic-ray- or radiation-sensitive resin composition comprising a resin (P) containing at least one repeating unit (a) represented by at least one of general formula (I) and (II) below and at least one repeating unit (b) represented by at least one of general formulae (III), (IV) and (V) below and further comprising a compound (B) that generates an acid when exposed to actinic rays or radiation, (ii) exposing the film to light by means of a KrF excimer laser, and (iii) developing the exposed film with a developer containing an organic solvent, thereby forming a negative pattern. |
