| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus that reduces particles which are produced in a wide range due to transportation and deposit on the substrate, and can easily treat the decreased particles at the time of maintenance. SOLUTION: The substrate treatment apparatus is directed for subjecting the substrate to be treated to predetermined treatment in a treatment chamber while transporting the substrate to be treated between the treatment chambers which can be exhausted, together with a tray in a state of having mounted the substrate to be treated on the tray, and includes: magnetic substances which are arranged below the transportation path of the tray so that the same magnetic poles face to each other along the direction of the transportation path of the tray; and a particle adsorber of which the top is covered with a member made from a non-magnetic material. COPYRIGHT: (C)2011,JPO&INPIT |
