| 发明名称 |
SUB-MICRON DECAL TRANSFER LITHOGRAPHY |
| 摘要 |
<p>The present invention provides a method of sub-micron decal transfer lithography. The method includes forming a first pattern in a surface of a first silicon-containing elastomer, bonding at least a portion of the first pattern to a substrate, and etching a portion of at least one of the first silicon-containing elastomer and the substrate.</p> |
| 申请公布号 |
EP1891479(B1) |
申请公布日期 |
2014.04.09 |
| 申请号 |
EP20060759191 |
申请日期 |
2006.05.05 |
| 申请人 |
DOW CORNING CORPORATION |
发明人 |
HEEJOON, AHN;NUZZO, RALPH;SHIM, ANNE |
| 分类号 |
G03F7/00;B41M1/34;B41M3/00 |
主分类号 |
G03F7/00 |
| 代理机构 |
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