发明名称
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a fine pattern which has superior mold releasing properties, high pattern formation precision, and superior permanent film characteristics of surface hardness etc. SOLUTION: The fine pattern manufacturing method includes the processes of: (A) simultaneously or sequentially applying at least two kinds of curable compositions differing in composition and including a polymerizable monomer and a polymerization initiator to form a layer composed of the curable compositions on a substrate or mold; (B) sandwiching the layer comprising the curable compositions between the substrate and mold by bringing the mold or substrate into contact with the layer composed of the curable compositions; (C) curing the layer composed of the curable compositions; and (D) peeling the mold from the film having been cured, wherein curable compositions composing a layer adjoining the mold contain fine particles by≤0.1 mass% after being cured, and curable composition composing a layer provided on a substrate side of the layer adjoining the mold contain fine particles. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP5463170(B2) 申请公布日期 2014.04.09
申请号 JP20100053401 申请日期 2010.03.10
申请人 发明人
分类号 H01L21/027;B29C59/02;C08F2/44 主分类号 H01L21/027
代理机构 代理人
主权项
地址
您可能感兴趣的专利