| 摘要 |
A negative type photosensitive resin composition containing a resin compound (A) which has a weight average molecular weight of 1000 or more, a (meth)acryloyl compound (B), a silane-modified resin (C), a radical-generating type photopolymerization initiator (D), and a silicon atom-free epoxy group-containing cross-linking agent (E), wherein the resin compound (A) contains a resin compound (A1) which has two or more (meth)acryloyl groups in a molecule and which has a carboxyl group which reacts with the epoxy group and the (meth)acryloyl compound (B) has a weight average molecular weight of less than 1000 and has two or more (meth)acryloyl groups in a molecule, is provided. |
