发明名称 PRECURSORS FOR CVD SILICON CARBO-NITRIDE FILMS
摘要 <p>Classes of liquid aminosilanes have been found which allow for the production of silicon carbo-nitride films of the general formula SixCyNz. These aminosilanes, in contrast, to some of the precursors employed heretofore, are liquid at room temperature and pressure allowing for convenient handling. In addition, the invention relates to a process for producing such films. The classes of compounds are generally represented by the formulas: and mixtures thereof, wherein R and R1 in the formulas represent aliphatic groups typically having from 2 to about 10 carbon atoms, e.g., alkyl, cycloalkyl with R and R1 in formula A also being combinable into a cyclic group, and R2 representing a single bond, (CH2)n, a ring, or SiH2. [Reference numerals] (AA) Average stress , 10^10 dynes/cm^2; (BB) Diethylaminosilane; (CC) Bis(Tertiarybutylamino)silane; (DD) NH_3 : Si material</p>
申请公布号 KR20140043413(A) 申请公布日期 2014.04.09
申请号 KR20140019249 申请日期 2014.02.19
申请人 AIR PRODUCTS AND CHEMICALS, INC. 发明人 MANCHAO XIAO;ARTHUR KENNETH HOCHBERG
分类号 C23C16/36;H01L21/304 主分类号 C23C16/36
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