发明名称 |
PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE |
摘要 |
There is provided a pattern forming method comprising: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern. |
申请公布号 |
KR20140043409(A) |
申请公布日期 |
2014.04.09 |
申请号 |
KR20137035000 |
申请日期 |
2012.06.28 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KATO KEITA;SHIRAKAWA MICHIHIRO;ODANI TADAHIRO;NAKAMURA ATSUSHI;TAKAHASHI HIDENORI;IWATO KAORU |
分类号 |
G03F7/095;G03F7/038;G03F7/039;G03F7/32;H01L21/027 |
主分类号 |
G03F7/095 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|