| 摘要 |
A nitride semiconductor structure of the present invention is obtained by growing an h- or t-BN thin film (12) and a wurtzite-structure Al x Ga 1-x N (x>0) thin film (14) as buffer layers and forming a single-crystal wurtzite-structure AlGaInBN thin film (13) thereon. While GaN, AlGaN, AlN, and the like have the wurtzite structure with sp 3 bonds, h-BN or t-BN has the graphite structure with sp 2 bonds, and has a completely different crystal structure. Accordingly, it has heretofore not been considered that a wurtzite-structure AlGaInBN thin film can be grown on a graphite-structure h-BN thin film. However, when a wurtzite-structure Al x Ga 1-x N (x>0) thin film (14) is formed as a buffer layer on a graphite-structure boron nitride thin film (12), a wurtzite-structure AlGaInBN (13) nitride semiconductor structure such as GaN can be grown on the buffer layer. |
