发明名称 |
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS |
摘要 |
An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma. |
申请公布号 |
KR20140043067(A) |
申请公布日期 |
2014.04.08 |
申请号 |
KR20137024542 |
申请日期 |
2012.03.23 |
申请人 |
GIGAPHOTON INC. |
发明人 |
WATANABE YUKIO;IGARASHI MIWA;MORIYA MASATO;NAKARAI HIROAKI |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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