发明名称 |
Projection objective for a microlithographic EUV projection exposure apparatus |
摘要 |
A projection objective for a microlithographic EUV projection exposure apparatus includes a first mirror and a second mirror. The first mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The second mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The first and second mirrors are configured so that, with otherwise equal irradiation by EUV light, the mirror substrate of the first mirror compacts less than the mirror substrate of the second mirror under the effect of the EUV light. |
申请公布号 |
US8693098(B2) |
申请公布日期 |
2014.04.08 |
申请号 |
US20100904513 |
申请日期 |
2010.10.14 |
申请人 |
RENNON SIEGFRIED;MANN HANS-JUERGEN;SCHICKETANZ THOMAS;CARL ZEISS SMT GMBH |
发明人 |
RENNON SIEGFRIED;MANN HANS-JUERGEN;SCHICKETANZ THOMAS |
分类号 |
G02B5/08;G02B1/10;G02B5/00 |
主分类号 |
G02B5/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|