| 发明名称 |
Method and apparatus for depositing a pattern on a substrate |
| 摘要 |
This invention relates to a process for forming a continuous pattern on a substrate with a liquid media. Upon the deposition of the liquid media on the substrate, a portion the continuous pattern is evaporated upon contact with the substrate. |
| 申请公布号 |
US8691667(B1) |
申请公布日期 |
2014.04.08 |
| 申请号 |
US20050321780 |
申请日期 |
2005.12.29 |
| 申请人 |
MACPHERSON CHARLES DOUGLAS;WALKER DENNIS DAMON;STAINER MATTHEW;E. I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
MACPHERSON CHARLES DOUGLAS;WALKER DENNIS DAMON;STAINER MATTHEW |
| 分类号 |
H01L21/326 |
主分类号 |
H01L21/326 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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