发明名称 |
Local exposure method and local exposure apparatus |
摘要 |
A local exposure method includes steps of: dividing a large block into a plurality of small blocks; setting irradiation illuminances different in a stepwise fashion; controlling light emission of light emitting elements based on the irradiation illuminances respectively set for the small blocks for a photosensitive film on a substrate moving with respect to light emitting elements; developing the photosensitive film having been subjected to exposure processing by irradiation by the light emitting elements; measuring a residual film thickness of the photosensitive film for each of the small blocks to obtain correlation data between the illuminance set for the small block and the residual film thickness; and obtaining a required illuminance of irradiation to each of the large blocks from a target residual film thickness of the photosensitive film set for each of the large blocks based on the correlation data. |
申请公布号 |
US8691481(B2) |
申请公布日期 |
2014.04.08 |
申请号 |
US201113326603 |
申请日期 |
2011.12.15 |
申请人 |
IKEDA FUMIHIKO;KUBOTA HIKARU;ONOUE KOUTAROU;TOKYO ELECTRON LIMITED |
发明人 |
IKEDA FUMIHIKO;KUBOTA HIKARU;ONOUE KOUTAROU |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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