发明名称 |
Reticle design for the reduction of lens heating phenomenon |
摘要 |
A reticle for lens heating mitigation includes a substrate, a target pattern and a redistributive pattern. The substrate includes a live pattern region and the target pattern is disposed within the live pattern region for constructing the target pattern onto a wafer. The redistributive pattern is also disposed within the live pattern region for redistributing energy onto a lens without being printed onto the wafer and without correcting said target pattern to be printed onto the wafer. |
申请公布号 |
US8691477(B2) |
申请公布日期 |
2014.04.08 |
申请号 |
US201213401858 |
申请日期 |
2012.02.22 |
申请人 |
ZHOU JIANMING;DEVILLIERS ANTON;BYERS ERIK;NANYA TECHNOLOGY CORP. |
发明人 |
ZHOU JIANMING;DEVILLIERS ANTON;BYERS ERIK |
分类号 |
G03F9/00;G03F1/44 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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