发明名称 |
Apparatus and methods for electron beam detection |
摘要 |
One embodiment disclosed relates a method of detecting a patterned electron beam. The patterned electron beam is focused onto a grating with a pattern that has a same pitch as the patterned electron beam. Electrons of the patterned electron beam that pass through the grating un-scattered are detected. Another embodiment relates to focusing the patterned electron beam onto a grating with a pattern that has a second pitch that is different than a first pitch of the patterned electron beam. Electrons of the patterned electron beam that pass through the grating form a Moiré pattern that is detected using a position-sensitive detector. Other embodiments, aspects and features are also disclosed. |
申请公布号 |
US8692204(B2) |
申请公布日期 |
2014.04.08 |
申请号 |
US201213453902 |
申请日期 |
2012.04.23 |
申请人 |
KOJIMA SHINICHI;BEVIS CHRISTOPHER F.;MAURINO JOSEPH;TONG WILLIAM M.;KLA-TENCOR CORPORATION |
发明人 |
KOJIMA SHINICHI;BEVIS CHRISTOPHER F.;MAURINO JOSEPH;TONG WILLIAM M. |
分类号 |
G01T1/20 |
主分类号 |
G01T1/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|