发明名称 VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD
摘要 The present invention relates to evaporator for forming a horizontal vapor deposition-type organic EL film, which is capable of minimizing an unnecessary evaporation time of an evaporation source. The evaporator for forming a horizontal vapor deposition-type organic EL film comprises: a robot transfer chamber in which a vacuum robot is arranged; two vapor deposition chambers connected to the robot transfer chamber; an index table configured to load two sheets of substrate, and housed in the vapor deposition chamber horizontally; a rotating means configured to rotate the index table horizontally; and an evaporation source arranged at a lower part of the index table to be moved horizontally. The vacuum robot can put a substrate in or out horizontally between the vapor deposition chamber and the robot transfer chamber. While one of the two sheets of substrate loaded on the index table is deposited in the evaporation source, the other is taken out of the vapor deposition chamber to the robot transfer chamber using the vacuum robot and, instead, a new substrate is put in the vapor deposition chamber from the robot transfer chamber. After the end of the deposition, the index table is rotated.
申请公布号 KR20140042654(A) 申请公布日期 2014.04.07
申请号 KR20130092453 申请日期 2013.08.05
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 WAKABAYASHI TADASHI;KATO NOBORU;ISHIZAWA YASUAKI;ZUSHI IORI
分类号 H01L51/56;H05B33/10 主分类号 H01L51/56
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