发明名称 SPRING MASK AND HIS PRODUCTION METHODS
摘要 The present invention relates to a spring mask manufactured by an electroforming method. The thickness of the spring mask is 30 microns to 60 microns and made of nickel-phosphorus alloy by the electroforming method. The spring mask is used as a spring in a mechanical structure focusing a camera lens in a cell phone, so the spring mask should satisfy a condition of equally maintaining elastic force with a thin and accurate thickness. As to the spring mask manufactured by the electroforming method, a solution in a plating bath consists of nickel sulfamate at the rate of 90 to 10. An electric conductor rotating with a basket is formed in the plating bath. The basket consists of a mass of nickel and connected to positive pole. The basket repeatedly and periodically moves back and forth. The rotating electric conductor is formed into a polygonal shape and connected to the negative pole. As 50%~70% of the pole is dipped in the plating bath, a non-photolithographic part formed into a spring mask shape is on each surface of the polygonal shape electric conductor by the electroforming method. An electric conductor plate having the non-photolithographic part formed into the spring mask shape spreads photosensitive materials on a substrate, and photolithographic part and non-photolithographic part are formed in the photosensitive materials through pattern films to chemically remove the non-photolithographic part.
申请公布号 KR20140042202(A) 申请公布日期 2014.04.07
申请号 KR20120108629 申请日期 2012.09.28
申请人 SEONG, NAK HOON;KIM, JUNG SIK 发明人 SEONG, NAK HOON;KIM, JUNG SIK
分类号 C25D1/10 主分类号 C25D1/10
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