| 发明名称 |
COMPOSITION THAT FORMS N-TYPE DIFFUSION LAYER, N-TYPE DIFFUSION LAYER MANUFACTURING METHOD AND SOLAR CELL ELEMENT MANUFACTURING METHOD |
| 摘要 |
<p>A composition for forming an n-type diffusion layer includes a glass powder containing P 2 O 5 , SiO 2 and CaO and a dispersion medium. An n-type diffusion layer and a photovoltaic cell element having an n-type diffusion layer are produced by applying the composition for forming an n-type diffusion layer on a semiconductor substrate and by subjecting the substrate to a thermal diffusion treatment.</p> |
| 申请公布号 |
KR20140041865(A) |
申请公布日期 |
2014.04.04 |
| 申请号 |
KR20147004451 |
申请日期 |
2012.07.17 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
MACHII YOICHI;YOSHIDA MASATO;NOJIRI TAKESHI;IWAMURO MITSUNORI;ORITA AKIHIRO;ADACHI SHUICHIRO;SATO TETSUYA |
| 分类号 |
H01L31/04;H01L31/18 |
主分类号 |
H01L31/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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