| 摘要 |
In one deposition apparatus, a deposition apparatus capable of performing an ALD mode and a CVD mode is disclosed. The gas injection unit of the deposition apparatus includes a first to a forth injection part which have a double structure for simultaneously injecting a first and a second source, a shower head module which includes a purge part which is formed between the first to the firth injection part and injects a purge gas, a top discharge part which is formed between the shower heads and discharges a residual gas, and a control part which controls the injection of the first and the second source gas to the first to the third injection part. |
