发明名称 GAS SYSTEM FOR REACTIVE DEPOSITION PROCESS
摘要 A gas lance unit configured for a reactive deposition process with a plurality of spaced apart crucibles, wherein spaces are provided between the crucibles, is described. The gas lance unit includes a gas guiding tube having one or more outlets for providing a gas for the reactive deposition process, and a condensate guiding element for guiding a condensate, particularly an aluminum condensate, to one or more positions above the spaces.
申请公布号 KR20140041506(A) 申请公布日期 2014.04.04
申请号 KR20137031668 申请日期 2011.04.29
申请人 APPLIED MATERIALS, INC. 发明人 HOFFMANN GERD;WOLFF ALEXANDER
分类号 C23C14/24;C23C14/56 主分类号 C23C14/24
代理机构 代理人
主权项
地址