| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method of a reflection mask, in which when a defective part in a smaller size than an original mask pattern, such as a designed defective part, is to be formed as an absorber pattern of a reflective mask, features of the defective part can be formed as designed, compared to a conventional method.SOLUTION: The production method comprises: forming a first hard mask pattern by using a first resist pattern on an absorption layer of a reflective mask blank; forming a second resist pattern that at least partially overlaps the absorption layer exposed through the first hard mask pattern; etching the first hard mask pattern exposed through the second resist pattern to form a second hard mask pattern; and etching the absorption layer by using the second hard mask pattern as an etching mask. |
