| 摘要 |
PROBLEM TO BE SOLVED: To provide a catadioptric projection objective that is suitable for use in a vacuum ultraviolet range having potential for very high image-side numerical aperture which may be extended to values allowing immersion lithography at numerical apertures NA>1.SOLUTION: A catadioptric projection objective lens for imaging a pattern provided in an object surface of the projection objective onto an image surface of the projection objective includes: a first refractive objective lens part for imaging the pattern provided in the object surface into a first intermediate image; a second objective lens part that has at least one concave surface mirror for imaging the first intermediate image into a second intermediate image; and a third refractive objective lens for imaging the second intermediate image onto the image surface. In the catadioptric projection objective lens, a projection objective lens has a maximum lens diameter D, a maximum image field height Y' and the image-side numerical aperture NA, COMP1=D/(Y'×NA), and a condition of COMP1<10 holds. |
