CHEMICAL VAPOR DEPOSITION APPARATUS FOR FLAT DISPLAY

摘要

According to an embodiment of the present invention, a chemical vapor deposition apparatus for a flat display comprises a process chamber where a vapor deposition process for a glass substrate is in progress; a backing plate spaced apart from a gas distribution plate having a plurality of through holes supplying process gas to the glass substrate to be placed above the upper area of the gas distribution plate, and supported by a lead plate unit forming the upper wall of the process chamber; and a first anti-sagging unit, which prevents the central area of the backing plate from sagging as being mounted into the backing plate to cross the central area of the backing plate.