| 摘要 |
PROBLEM TO BE SOLVED: To provide a hard coat composition showing excellent light-resistant adhesiveness and a hard coat film formed by applying the composition, obtained by determining a film thickness range of a mixture layer to be formed when a solvent that can dissolve a substrate is used in a hard coating liquid so as to improve light-resistant adhesiveness while maintaining mechanical strength.SOLUTION: The hard coat composition comprises an ionization radiation-curable resin containing a polyfunctional monomer having two or more (meth)acryloyl groups in one molecule, a photopolymerization initiator and a solvent. A film thickness ratio of a mixture layer of a substrate and the hard coat composition, formed by applying the hard coat composition, is controlled to 32% or more and 61% or less with respect to the whole film thickness of the hard coat layer. Thereby, excellent light-resistant adhesiveness can be obtained while maintaining mechanical strength. |
