RECOGNITION DEVICE FOR SUBSTRATE PROCESSING MACHINE

摘要

A recognition device for substrate processing machine comprises: a reading device for reading an object; a feature parameter preparation device for preparing a feature parameter from the read object; a first memory for storing a reference parameter associated with the feature parameter; and a signal output device for outputting a maintenance request signal on the basis of the hit rate representing the correlation between the feature parameter and the reference parameter. The signal output device outputs the maintenance request signal when the hit rate reaches a maintenance threshold different from an error threshold in a stage where the hit rate does not reach the error threshold.