发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 <p>Provided is a photosensitive resin composition which exhibits excellent adhesion during development, while maintaining high sensitivity, transparency and chemical resistance. A photosensitive resin composition which contains: (1) a polymer that has (a1) a constituent unit having a group wherein an acid group is protected with an acid-decomposable group and (a2) a constituent unit having a crosslinkable group, and (2) (a1) a polymer that has a constituent unit having a group wherein an acid group is protected with an acid-decomposable group, and/or (a2) a polymer which has a constituent unit having a crosslinkable group; (S) a polymer that has a weight average molecular weight of 1,000-50,000 and a constituent unit containing a carboxyl group; (B) a photoacid generator; and (C) a solvent. The polymer (S) has a value represented by formula (1) of 50-3,000. Formula (1): [solid acid value (unit: mgKOH/g) of polymer (S)] × [content ratio (unit: mass%) of polymer (S) relative to total solid content in photosensitive resin composition]</p>
申请公布号 WO2014050730(A1) 申请公布日期 2014.04.03
申请号 WO2013JP75443 申请日期 2013.09.20
申请人 FUJIFILM CORPORATION 发明人 YAMAZAKI KENTA;SHIMOYAMA TATSUYA
分类号 G03F7/004;C08F20/06;C08F20/32;C08L33/02;C08L33/14;G02F1/1333;G03F7/039;H01L51/50;H05B33/22 主分类号 G03F7/004
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