发明名称 SUPPORTING UNIT, SUBSTRATE TREATING DEVICE INCLUDING THE SAME, AND METHOD OF MANUFACTURING THE SUPPORTING UNIT
摘要 Provided is a supporting unit. The supporting unit includes: a supporting plate including a substrate on a top surface thereof; and a heater having a predetermined pattern at a bottom surface of the supporting plate and heating the supporting plate, wherein the heater includes: a first metal plating layer applied on the bottom surface of the supporting plate along the predetermined pattern; an anti-oxidation layer of a conductive material applied on the first metal plating layer along the predetermined pattern; and a second metal plating layer of a conductive material applied on the anti-oxidation layer in a portion of the pattern.
申请公布号 US2014091077(A1) 申请公布日期 2014.04.03
申请号 US201314039422 申请日期 2013.09.27
申请人 SEMES CO., LTD. 发明人 KONG TAE KYUNG
分类号 H01L21/67;C25D5/02 主分类号 H01L21/67
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