发明名称 FIN STURCTURED FIELD EFFECT TRANSISTOR, MEMORY DEVICE INCLUDING THE SAME AND SEMICONDUCTOR DEVICE THEREOF
摘要 <p>Provided are a field effect transistor, a memory device including the same, and a system on chip including the same. A field effect transistor according to one embodiment of the present invention includes a first silicide which is separated from a gate and located in the upper part of a source, a second silicide which is separated from the gate and located on the upper part of a drain, and one or more contacts which are located on the upper part of the first silicide and the second silicide, respectively. The capacitance of the first silicide and the second silicide with regard to the gate can be different from each other. According to the present invention, the total capacitance is reduced and the read stability and the write stability of the memory device can be improved.</p>
申请公布号 KR20140040543(A) 申请公布日期 2014.04.03
申请号 KR20120107381 申请日期 2012.09.26
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SONG, TAE JOONG;KIM, GYU HONG;PARK, JAE HO;JUNG, JONG HOON
分类号 H01L29/78;H01L21/336;H01L21/8244;H01L27/11 主分类号 H01L29/78
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