发明名称 SEMICONDUCTOR EPITAXIAL STRUCTURE
摘要 A semiconductor epitaxial structure is provided. The semiconductor epitaxial structure includes a substrate, a doped semiconductor epitaxial layer, and a carbon nanotube layer. The doped semiconductor epitaxial layer is located on the substrate. The carbon nanotube layer is located between the substrate and the doped semiconductor epitaxial layer. The carbon nanotube layer can be a carbon nanotube film drawn from a carbon nanotube array and including a number of successive and oriented carbon nanotubes joined end-to-end by van der Waals attractive force therebetween.
申请公布号 US2014091323(A1) 申请公布日期 2014.04.03
申请号 US201314098775 申请日期 2013.12.06
申请人 HON HAI PRECISION INDUSTRY CO., LTD.;TSINGHUA UNIVERSITY 发明人 WEI YANG;FAN SHOU-SHAN
分类号 H01L33/12;H01L29/06 主分类号 H01L33/12
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