发明名称 METHOD FOR PRODUCING SILICON SINGLE CRYSTAL FOR EVALUATION
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a silicon single crystal by a Czochralski process (CZ process) that may grow a dislocation-free silicon single crystal for evaluation having no crystal defect, when growing the silicon single crystal for evaluating the quality of high-purity polycrystalline silicon used for a semiconductor and a solar cell.SOLUTION: A method for producing a silicon single crystal for evaluation by a CZ process comprises the steps for melting a polycrystalline silicon to be evaluated in a crucible, immersing a seed crystal consisting of a dislocation-free silicon single crystal in the silicon melt, and then pulling up the seed crystal without necking to grow a straight body of the dislocation-free silicon single crystal, in which a temperature profile of the silicon melt charged in the crucible for heating it in a direction along a liquid surface is a temperature that is constant in a region being the center of the crucible and being equivalent to a diameter for pulling up the silicon single crystal and increases from the center toward an outer edge of the crucible.
申请公布号 JP2014058414(A) 申请公布日期 2014.04.03
申请号 JP20120203430 申请日期 2012.09.14
申请人 JNC CORP;JX NIPPON MINING & METALS CORP;TOHO TITANIUM CO LTD 发明人 ITAKURA ISAO;KAWAI TAKAHIRO;SATO KENJI
分类号 C30B29/06;C30B15/02;C30B15/14 主分类号 C30B29/06
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