发明名称 |
METHOD FOR PRODUCING SILICON SINGLE CRYSTAL FOR EVALUATION |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a silicon single crystal by a Czochralski process (CZ process) that may grow a dislocation-free silicon single crystal for evaluation having no crystal defect, when growing the silicon single crystal for evaluating the quality of high-purity polycrystalline silicon used for a semiconductor and a solar cell.SOLUTION: A method for producing a silicon single crystal for evaluation by a CZ process comprises the steps for melting a polycrystalline silicon to be evaluated in a crucible, immersing a seed crystal consisting of a dislocation-free silicon single crystal in the silicon melt, and then pulling up the seed crystal without necking to grow a straight body of the dislocation-free silicon single crystal, in which a temperature profile of the silicon melt charged in the crucible for heating it in a direction along a liquid surface is a temperature that is constant in a region being the center of the crucible and being equivalent to a diameter for pulling up the silicon single crystal and increases from the center toward an outer edge of the crucible. |
申请公布号 |
JP2014058414(A) |
申请公布日期 |
2014.04.03 |
申请号 |
JP20120203430 |
申请日期 |
2012.09.14 |
申请人 |
JNC CORP;JX NIPPON MINING & METALS CORP;TOHO TITANIUM CO LTD |
发明人 |
ITAKURA ISAO;KAWAI TAKAHIRO;SATO KENJI |
分类号 |
C30B29/06;C30B15/02;C30B15/14 |
主分类号 |
C30B29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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