发明名称 EPITAXIAL WAFER FOR 2 WAVELENGTH SEMICONDUCTOR LASER AND MANUFACTURING METHOD THEREFOR AND 2 WAVELENGTH SEMICONDUCTOR LASER ASSEMBLY
摘要 PROBLEM TO BE SOLVED: To provide an epitaxial wafer for 2 wavelength semiconductor laser in which deviation of polarization angle from 0 degree can be suppressed, and to provide a manufacturing method therefor and a 2 wavelength semiconductor laser assembly.SOLUTION: First and second compound semiconductor layers 12a, 12b for semiconductor laser are provided alternately in the width direction of an epitaxial wafer 10 for 2 wavelength semiconductor laser. Indium composition of one of the first and second compound semiconductor layers 12a, 12b for semiconductor laser increases in the width direction from one end toward the other end, and indium composition of the other of the compound semiconductor layers decreases in the width direction from one end toward the other end. (The width direction is a direction perpendicular to the laser light oscillation direction of the first and second compound semiconductor layers for semiconductor laser, and the growth direction of the first and second compound semiconductor layers for semiconductor laser).
申请公布号 JP2014060323(A) 申请公布日期 2014.04.03
申请号 JP20120205612 申请日期 2012.09.19
申请人 HITACHI METALS LTD 发明人 WATANABE NAOYUKI
分类号 H01S5/22 主分类号 H01S5/22
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