发明名称 RADIATION PAINT COMPOSITION AND RADIATION STRUCTURE
摘要 The present invention relates to: a radiation paint composition enabling a radiation layer having excellent heat radiation and remarkable brine resistance, film strength, adhesion, scratch resistance or the like to be formed on various products; and a radiation structure. The radiation paint composition comprises: an epoxy resin; a curing agent; a carbon-based filler having a functional group comprising at least one selected from the group consisting of an amine group, an amide group, a carboxyl group and a hydroxyl group; and a solvent.
申请公布号 WO2014051295(A1) 申请公布日期 2014.04.03
申请号 WO2013KR08491 申请日期 2013.09.23
申请人 HANWHA CHEMICAL CORPORATION 发明人 JEON, SEONG YUN;DO, SEUNG HOE;LEE, JIN SEO
分类号 C09D163/00;C09D7/12 主分类号 C09D163/00
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