| 摘要 |
The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system for a microlithographic projection exposure apparatus comprises at least one mirror arrangement (200, 400) having a plurality of mirror elements (200a, 200b, 200c,..., 400a, 400b, 400c,... ), wherein these mirror elements can be adjusted independently of one another for changing an angular distribution of the light reflected by the mirror arrangement, and a polarization-influencing optical arrangement (110, 210, 310, 320, 330) which is arranged downstream of the mirror arrangement (200, 400) in the light propagation direction, wherein the polarization-influencing optical arrangement (110, 210, 310, 320, 330) reflects a light beam incident on the arrangement (110, 210, 310, 320, 330) in at least two reflections, which do not occur in a common plane, for at least one angular distribution of the light reflected by the mirror arrangement (200, 400). |
